Molybdenum Target

Molybdenum Target

1.Moly and Molybdenum alloy target will be used as a cathode source when sputtering, no matter the impurities in solid thing, or O2 /H2O in gas , both will pollute the film and affect films property, that why requires high purity.

2.The density of Moly &Molybdenum alloy target will effect not only deposition rate and also electric and light property. If low relative density, there are many bubbles inside molybdenum target, when sputtering, gas inside suddenly release will make target granules sputtering, so that reduce the performance of film.

3.molybdenum target with fine grains sputtering rate is higher than coarse grains, also the thickness of films will be evenly distributed.

Molybdenum sputtering targets are widely used in thin-film deposition techniques, where the molybdenum target is bombarded by ions to sputter and deposit a thin film onto a substrate. This thin film can exhibit molybdenum’s characteristics such as high melting point, high strength, and corrosion resistance. It finds applications in enhancing surface properties of materials, as well as in electronic devices, solar cells, coating protection, and other fields.
The fabrication of molybdenum sputtering targets often requires high-purity molybdenum materials to ensure the quality and performance of the deposited films. These targets can be manufactured in various shapes and sizes, such as discs, rectangles, rings, etc., depending on specific application requirements.

In summary, a molybdenum sputtering target is a molybdenum material used in the process of physical vapor deposition, where it is sputtered onto a substrate to form a thin film. It has a wide range of applications and demands high purity.