Tungsten Ion Implanted Parts

Material: W1
Density: 19.3g/cm3
Purity: 99.95%
Melting point: 3410
Operating temperature: Vacuum 2600
Application: electrode
tungsten ion implantation
electric light source
high temperature heating tungsten material

Product Details

Tungsten ion implanted parts

Tungsten metal density, high melting point, strong thermal conductivity and other advantages, so it is a very good material for semiconductors.

Tungsten ion implantation process

Tungsten ion implantation process is now an important part of semiconductor manufacturing, the use of high-energy charged ion beam injection form, doping atoms into the semiconductor, to achieve material performance optimization.

Advantages of tungsten ion implantation

Tungsten metal high temperature performance is stable, long service life, in semiconductor ion implantation, the preferred metal tungsten, including shielding cylinder, launch panel, center fixed rod, etc..

tungsten parts
tungsten parts

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Ion implanted tungsten sleeve, tungsten sleeve, tungsten screw, tungsten screw, tungsten nut, tungsten ion implanted workpiece, semiconductor tungsten ion implanted workpiece.